@article{JETPL.115.89,
    title = {Forming-Free Memristors Based on Hafnium Oxide Processed in Electron Cyclotron Resonance Hydrogen Plasma},
    author = {Perevalov, T. V. and Iskhakzai, R. M. Kh. and Prosvirin, I. P. and Aliev, V. Sh. and Gritsenko, V. A.},
    journal = {JETP Lett.},
    volume = {115},
    issue = {2},
    pages = {79},
    year = {2022},
    doi = {10.1134/S0021364022020084},
    url = {http://jetpletters.ru/ps/dx/10.31857/S1234567822020045},
    note = {[Pisma v ZhETF 115, 89 (2022)]}
}