Anomalous behavior of monatomic steps in (1 x 1)
(7 x 7) reconstruction at an atomically clean silicon (111) surface
Latyshev A. V. , Aseev A. L., Stenin S. I.
Analysis of the behavior of monatomic steps on the silicon (111) surface by means of ultrahigh-vacuum reflection electron microscopy reveals a redistribution of a significant number of the atoms during the reconstruction (lXl)«^(7X7).