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VOLUME 123 (2026) | ISSUE 5 | PAGE 378
VLS grating for X-Ray optics as fabricated by e-beam nanolithography with optically confirmed exponential line-density variation
Abstract
We report the development of a large-area plane Varied Line-Space grating with line density varying exponentially along the grating surface roughly from 160 to 560 mm-1. The grating was produced using e-beam lithography with original square-stamp beam profile and is intended for an innovative high-resolution single-component grazing-incidence monochromator, in which wavelength scanning is achieved simply by linear movement of the grating along its surface. For a grating width of 60 mm, the first-order operating spectral range is 9-20 nm. Optical measurements of the line density-vs-coordinate dependence reveal perfect match between the fabricated and intended by the design density dependences.